Evaporation materials : for sources of thin films such as MgF2, SiO2, Ti3O5 etc. - ---

evaporation material for sources of thin film, - coating of lens, - laser filters, - LCD panel, - architectural glass - details see: //www.sourcingmetals.com/evaporation-materials-for-sources-of-thin-films-such-as-mgf2-sio2-ti3o5-etc-10193071
Place of Origin: JapanBrand Name: ---Model Number: ---Application: evaporation material
Shape: pellet or granuleMaterial: see the tableDimensions: ---Chemical Composition: see the table
Evaporation materials : for sources of thin films such as MgF2, SiO2, Ti3O5 etc.
contact supplier for Evaporation materials : for sources of thin films such as MgF2, SiO2, Ti3O5 etc.


Applications
These evaporation materials are sources of thin films, which are used in a broad variety of applications and industries, such as anti-reflection coating of lenses, laser filters, mirrors, liquid crystal display panels and architectural glass.

Features of PELLET TYPE materials

- Easy to use
- Various shapes are available
- You can find the one best suited to your need
- High thermal shock resistance materials are also available

Features of GRANULE TYPE materials

- You can add evaporation materials as needed
- Suited for continuous evaporation
- Low gas granules can be also provided

Evaporation material products

Refractive
index *1
Product nameMain compoundPellet
*3
Granule
*4
Remarks

Materials for optical films

1.33ChioliteNa5Al3F14OO
1.35CryoliteNa3AlF6-O
1.36AlF3AlF3-O
1.38MgF2MgF2-O
1.43CaF2CaF2-O
1.47SiO2SiO2OO
1.48BaF2BaF2-OTransparent in the infrared region
1.48S4FSiO2+Al2O3OO
1.48S5FSiO2+Al2O3OO
1.52YF3YF3-O
1.59LaF3LaF3OO
1.60CeF3CeF3OO
1.60NdF3NdF3-O
1.64Al2O3Al2O3OOStabilized by the inclusion of oxygen
1.69OM-4ZrO2+Al2O3OO
1.7-2.0SiOSiOOO
1.74MgOMgOOO
1.75OM-6ZrO2+Al2O3O-
1.81Y2O3Y2O3OO
2.00OH-14La2Ti2O7-O
2.00SnO2SnO2O-
2.05OA-100Ta2O5OORequires the inclusion of oxygen
2.07ZrO2ZrO2OO
2.13CeO2CeO2OOAbsorbs ultraviolet rays
2.14WO3WO3O-
2.16OH-6ZrO2+TiO2O-
2.18OH-5ZrO2+TiO2OO
2.20Ta2O5Ta2O5OO
2.22OA-500Ta2O5+ZrO2-O
2.24OA-600Ta2O5+TiO2-O
2.31OS-50Ti3O5-ORequires the inclusion of oxygen
2.33OS-10Ti4O7-ORequires the inclusion of oxygen
2.33Ti2O3Ti2O3O-Requires the inclusion of oxygen
2.35TiOTiO-ORequires the inclusion of oxygen
2.35TiO2TiO2OO
2.37Nb2O5Nb2O5-O
2.37Low gas Nb2O5Nb2O5-ORequires the inclusion of oxygen
3.48 *2SiSi-OTransparent in the infrared region

Materials for metal films or other purposes

-AgAg-O
-AlAl--Mostly wire-shaped
-AuAu--Mostly wire-shaped
-CrCr-O
-NiNi-O

Materials for functional films

1.35OF-SROil-repellent--Organic material
1.35OF-210Water-repellent--Organic material

* 1) Measured at wavelength of 500 nm, all for reference purposes
* 3)*4) Indicates the difference in shape
* 2) Measured at wavelength of 1550 nm, all for reference purposes

Our Company Profile

M.WATANABE & CO., LTD.

Established 1930

2-16, 4-Chome, Nihonbashi-Muromachi,

Chuo-Ku, Tokyo 103-0022, JAPAN

M.WATANABE & CO., LTD. deals in various parts and equipments for semiconductor industry field and also the materials such as quartz for electronics industry.

We have business experiences in:

Australia, Brazil, China, Czech, French, Germany, India, Italy, Japan, Malaysia, Singapore, South Korea, Sri Lanka, Taiwan, Thailand, U.K., U.S.A. etc.

Packaging Detail:safe and appropriate packing
Delivery Detail:depends on each product

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